Crystallization of 8mol% yttria-stabilized zirconia thin-films deposited by RF-sputtering
نویسندگان
چکیده
a Laboratory for Development and Methods, Paul Scherrer Institut, 5232 Villigen-PSI, Switzerland b General Energy Research Department, Paul Scherrer Institut, 5232 Villigen-PSI, Switzerland c Massachusetts Institute of Technology (MIT), Department of Materials Science and Engineering and Department of Nuclear Science and Engineering, 77 Massachusetts Ave, Cambridge, MA 02139, USA d Electron Microscopy ETH Zurich (EMEZ), ETH Zurich, Wolfgang Pauli Str. 16, 8093 Zurich, Switzerland e Ion Beam Physics, ETH Zurich, 8093 Zurich, Switzerland f Nonmetallic Inorganic Materials, Department of Materials, ETH Zurich, Wolfgang Pauli Str. 10, 8093 Zurich, Switzerland g International Institute for Carbon Neutral Energy Research (WPI-I2CNER), Kyushu University, 744 Moto-oka, Nishi-ku, Fukuoka 819-0395, Japan
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